hardware
EVACTRON
Plasma Cleaner
Specifications:
- Radical oxygen source (PSR v)
- Computerized, automatic, electronic control unit for pressure and HF power (max. 20 Watt)
- CE Certified
Application example
Before cleaning
During cleaning (duration 3min)
After cleaning
Sputtering System
Specifications:
- AU Target
- Coating thickness adjustable from 1 to 50mm
- Current strength adjustable from 5 to 15mA
- Sample chamber ø 105mm
- Power without pump 120W
- Power supply 230V, 50/50Hz
Circulating Cooler – Cooling Mobile
Specifications:
- Cooling capacity 1,200 Watt at +20°C
- Working area 0°C until +40°C
- Circulating pump conveying pressure max 2.6bar
- With LED display
- Optimized for SEM and TEM, other configurations possible
SDD-Detector
Specifications SDD Detectors:
- Based on Silicon Drift Detector technology
- Nitrogen-free energy dispersive X-ray detector with compact dimensions
- No nitrogen necessary
- Excellent resolution < 127eV to < 138eV
- Crystal area 100mm² and 30mm²
- Active crystal thickness 450µm
- Processing of extremely high-count rate > 100.00 together with the digital pulse processor NumeriX
- Analysis from boron
- Window type Si3N4 ceramic window or AP3.3
- Ideal for fast distribution images
- Retrofit to all common EDX systems (e.g., Oxford, Bruker, EDAX, Noran …) possible
Specifications Si(Li) Detectors:
- Resolution < 129eV, Mn, 1000cps
- Thin-film window AP3.3
- Crystal area 10mm² or 30mm²
Scroll pump
Specifications:
- Suitable for applications in the rough and fine vacuum range
- Completely oil-free and dry running
- First class suction power
- Low noise emission
Rotary vane pump
Specifications:
- Suitable for applications in the rough and fine vacuum range
- Designed for continuous operation
- Low energy consumption
- Designed as tabletop or stand-alone unit
EVACTRON
ZEPHYR CLEANING
Specifications:
- Version for SEM/FIB systems
- Fast and efficient hydrocarbon removal
- No damage to the specimens or sensitive components
- Operation with rough and turbomolecular pressure
- Remote computer interface
- With Desktop controller
- SEM/FIB chambers or locks
- 2 operating modes with classic module (roughing pressures) or T-pump operation (turbomolecular pressures)
E50 Plasma DE-Contaminator
Specifications:
- Remote controlled hollow cathode plasma radical source
- Desktop controller with push button operation
- Android tablet with Bluetooth communication
- Library with tested recipes and options to modify power, cycles, cleaning duration, etc.
- RF power 35-75 Watt at 13.56 MHz RFHC
- 100-240VAC 50/60 Hz input
E50 E-TC Plasma DE-Contaminator
Specifications:
- Remote controlled hollow cathode plasma radical source
- 2U Rackmount controller for system integration
- Hardware interlock
- Powerful compact plasma radical source (PRS.
- RF power 35-75 Watt at 13.56 MHz RFHC
- 100-240VAC 50/60 Hz input
E50 OEM Plasma DE-Contaminator
Specifications
- Remote controlled hollow cathode plasma radical source
- 2U Rackmount controller for system integration
- Hardware interlock
- Powerful compact plasma radical source (PRS.)
- RF power 35-75 Watt at 13.56 MHz RFHC
- 100-240VAC 50/60 Hz input
U50 UHV Vakuum Cleaning System
Specifications:
- RF power 75 W peak power, up to 50 W continuous power
- Double-acting cleaning by plasma and UV afterglow
- Energy efficient radio frequency hollow cathode plasma (RFHC)
- Conflat 2.75 flange for UHV compatibility
- Programmable power, cleaning time, number of cycles, recipes
- Connected touchpad communication module
- Pressure operation over a wide range: 0.3 Pa/ 2mTorr to 80Pa/600mTorr
- Bakeable up to 150°C
- TMP compatible
- No pre-venting required
- Fast cleaning
- No damage to sensitive components – no sputter etching
- Leak test to <10-11 Torr or 10-11 mBar (1.3E 9 Pa)
- Cleaning at the push of a button
- No matches or gas flow adjustments for the plasma ignition required