hardware

Plasma Cleaner

remx-gmbh-76646-bruchsal-Rasterelektronenmikroskop-Mikroskop-samx-service-verkauf-transport-software-hardware-gebraucht-evactron-e25-zephyr

Specifications:

  • Radical oxygen source (PSR v)
  • Computerized, automatic, electronic control unit for pressure and HF power (max. 20 Watt)
  • CE Certified

Application example

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Before cleaning

During cleaning (duration 3min) 

After cleaning

Sputtering System

remx-gmbh-76646-bruchsal-Rasterelektronenmikroskop-Mikroskop-samx-service-verkauf-transport-software-hardware-gebraucht-sputteranlagen

Specifications:

  • AU Target
  • Coating thickness adjustable from 1 to 50mm
  • Current strength adjustable from 5 to 15mA
  • Sample chamber ø 105mm
  • Power without pump 120W
  • Power supply 230V, 50/50Hz

Circulating Cooler – Cooling Mobile

remx-gmbh-76646-bruchsal-Rasterelektronenmikroskop-Mikroskop-samx-service-verkauf-transport-software-hardware-gebraucht-umlaufkuehler-kuehlmobil

Specifications:

  • Cooling capacity 1,200 Watt at +20°C
  • Working area 0°C until +40°C
  • Circulating pump conveying pressure max 2.6bar
  • With LED display
  • Optimized for SEM and TEM, other configurations possible

SDD-Detector

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Specifications SDD Detectors:

  • Based on Silicon Drift Detector technology
  • Nitrogen-free energy dispersive X-ray detector with compact dimensions
  • No nitrogen necessary
  • Excellent resolution < 127eV to < 138eV
  • Crystal area 100mm² and 30mm²
  • Active crystal thickness 450µm
  • Processing of extremely high-count rate > 100.00 together with the digital pulse processor NumeriX
  • Analysis from boron
  • Window type Si3N4 ceramic window or AP3.3
  • Ideal for fast distribution images
  • Retrofit to all common EDX systems (e.g., Oxford, Bruker, EDAX, Noran …) possible
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Specifications Si(Li) Detectors:

  • Resolution < 129eV, Mn, 1000cps
  • Thin-film window AP3.3
  • Crystal area 10mm² or 30mm²

Scroll pump

remx-gmbh-76646-bruchsal-Rasterelektronenmikroskop-Mikroskop-samx-service-verkauf-transport-software-hardware-gebraucht-scrollpumpe

Specifications:

  • Suitable for applications in the rough and fine vacuum range
  • Completely oil-free and dry running
  • First class suction power
  • Low noise emission

Rotary vane pump

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Specifications:
  • Suitable for applications in the rough and fine vacuum range
  • Designed for continuous operation
  • Low energy consumption
  • Designed as tabletop or stand-alone unit

EVACTRON

ZEPHYR CLEANING

remx-gmbh-76646-bruchsal-Rasterelektronenmikroskop-Mikroskop-samx-service-verkauf-transport-software-hardware-gebraucht-evactron-e25-zephyr

Specifications:

  • Version for SEM/FIB systems
  • Fast and efficient hydrocarbon removal
  • No damage to the specimens or sensitive components
  • Operation with rough and turbomolecular pressure
  • Remote computer interface
  • With Desktop controller
  • SEM/FIB chambers or locks
  • 2 operating modes with classic module (roughing pressures) or T-pump operation (turbomolecular pressures)

E50 Plasma DE-Contaminator

remx-gmbh-76646-bruchsal-Rasterelektronenmikroskop-Mikroskop-samx-service-verkauf-transport-software-hardware-gebraucht-evactron-e50-plasmacleaner

Specifications:

  • Remote controlled hollow cathode plasma radical source
  • Desktop controller with push button operation
  • Android tablet with Bluetooth communication
  • Library with tested recipes and options to modify power, cycles, cleaning duration, etc.
  • RF power 35-75 Watt at 13.56 MHz RFHC
  • 100-240VAC 50/60 Hz input

E50 E-TC Plasma DE-Contaminator

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Specifications:

  • Remote controlled hollow cathode plasma radical source
  • 2U Rackmount controller for system integration
  • Hardware interlock
  • Powerful compact plasma radical source (PRS.
  • RF power 35-75 Watt at 13.56 MHz RFHC
  • 100-240VAC 50/60 Hz input

E50 OEM Plasma DE-Contaminator

remx-gmbh-76646-bruchsal-Rasterelektronenmikroskop-Mikroskop-samx-service-verkauf-transport-software-hardware-gebraucht-evactron-e50-oem-plasma

Specifications

  • Remote controlled hollow cathode plasma radical source
  • 2U Rackmount controller for system integration
  • Hardware interlock
  • Powerful compact plasma radical source (PRS.)
  • RF power 35-75 Watt at 13.56 MHz RFHC
  • 100-240VAC 50/60 Hz input

U50 UHV Vakuum Cleaning System

remx-gmbh-76646-bruchsal-Rasterelektronenmikroskop-Mikroskop-samx-service-verkauf-transport-software-hardware-gebraucht-evactron-u50-vakuum-cleaning-system

Specifications:

  • RF power 75 W peak power, up to 50 W continuous power
  • Double-acting cleaning by plasma and UV afterglow
  • Energy efficient radio frequency hollow cathode plasma (RFHC)
  • Conflat 2.75 flange for UHV compatibility
  • Programmable power, cleaning time, number of cycles, recipes
  • Connected touchpad communication module
  • Pressure operation over a wide range: 0.3 Pa/ 2mTorr to 80Pa/600mTorr
  • Bakeable up to 150°C
  • TMP compatible
  • No pre-venting required
  • Fast cleaning
  • No damage to sensitive components – no sputter etching
  • Leak test to <10-11 Torr or 10-11 mBar (1.3E 9 Pa)
  • Cleaning at the push of a button
  • No matches or gas flow adjustments for the plasma ignition required