HARDWARE

Plasmacleaner

Sputteranlagen

Umlaufkühler - Kühlmobil

SDD-Detektoren

Scrollpumpe

Drehschieberpumpe

ZEPHYR CLEANING

E50 Plasma DE-Contaminator

E50 E-TC Plasma DE-Contaminator

E50 OEM Plasma DE-Contaminator

U50 UHV Vakuum Cleaning System

Specifications:

• Radical oxygen source (PSR v)
• Computerized, automatic, electronic control unit for pressure and HF power (max. 20 Watt)
• CE Certified

Before cleaning

During cleaning (duration 3min)

After cleaning

Specifications:

• AU Target
• Coating thickness adjustable from 1 to 50mm
• Current strength adjustable from 5 to 15mA
• Sample chamber ø 105mm
• Power without pump 120W
• Power supply 230V, 50/50Hz

Specifications:

• Cooling capacity 1,200 Watt at +20°C
• Working area 0°C until +40°C
• Circulating pump conveying pressure max 2.6bar
• With LED display
• Optimized for SEM and TEM, other configurations possible

Specifications SDD Detectors:

• Based on Silicon Drift Detector technology
• Nitrogen-free energy dispersive X-ray detector with compact dimensions
• No nitrogen necessary
• Excellent resolution < 127eV to < 138eV
• Crystal area 100mm² and 30mm²
• Active crystal thickness 450µm
• Processing of extremely high-count rate > 100.00 together with the digital pulse processor NumeriX
• Analysis from boron
• Window type Si3N4 ceramic window or AP3.3
• Ideal for fast distribution images
• Retrofit to all common EDX systems possible

Specifications Si(Li) Detectors:

• Resolution < 129eV, Mn, 1000cps
• Thin-film window AP3.3
• Crystal area 10mm² or 30mm²

Specifications:

• Suitable for applications in the rough and fine vacuum range
• Completely oil-free and dry running
• First class suction power
• Low noise emission

Specifications:

• Suitable for applications in the rough and fine vacuum range
• Designed for continuous operation
• Low energy consumption
• Designed as tabletop or stand-alone unit

Specifications:

• Version for SEM/FIB systems
• Fast and efficient hydrocarbon removal
• No damage to specimens or sensitive components
• Operation with rough and turbomolecular pressure
• Remote computer interface
• With desktop controller
• SEM/FIB chambers or locks
• Two operating modes with classic module or T-pump operation

Specifications:

• Remote controlled hollow cathode plasma radical source
• Desktop controller with push button operation
• Android tablet with Bluetooth communication
• Library with tested recipes and options to modify power, cycles, and cleaning duration
• RF power 35-75 Watt at 13.56 MHz RFHC
• 100-240VAC 50/60 Hz input

Specifications:

• Remote controlled hollow cathode plasma radical source
• 2U Rackmount controller for system integration
• Hardware interlock
• Powerful compact plasma radical source
• RF power 35-75 Watt at 13.56 MHz RFHC
• 100-240VAC 50/60 Hz input

Specifications

• Remote controlled hollow cathode plasma radical source
• 2U Rackmount controller for system integration
• Hardware interlock
• Powerful compact plasma radical source
• RF power 35-75 Watt at 13.56 MHz RFHC
• 100-240VAC 50/60 Hz input

Specifications:

• RF power 75 W peak power, up to 50 W continuous power
• Double-acting cleaning by plasma and UV afterglow
• Energy efficient radio frequency hollow cathode plasma
• Conflat 2.75 flange for UHV compatibility
• Programmable power, cleaning time, number of cycles, and recipes
• Connected touchpad communication module
• Pressure operation over a wide range
• Bakeable up to 150°C
• TMP compatible
• No pre-venting required
• Fast cleaning
• No damage to sensitive components
• Cleaning at the push of a button